Physical measurement and analysis of thin films by E M. Murt

Cover of: Physical measurement and analysis of thin films | E M. Murt

Published by Plenum P .

Written in English

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Edition Notes

Selected papers from the 1967 Eastern Analytical Symposium.

Book details

Statemented. by E.M. Murt and W.G. Guldner.
SeriesProgress in analytical chemistry -- vol.2
ContributionsGuldner, W G.
The Physical Object
Number of Pages194
ID Numbers
Open LibraryOL13692376M

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OCLC Number: Description: xi, pages: illustrations ; 24 cm. Contents: Nondestructive optical techniques for thin-film thickness measurements / by W.A. Pliskin --A review of x-ray methods for investigating thin films and platings / by Eugene P.

Bertin --X-ray fluorescence and electron microprobe techniques for determination of thin-film thickness / by James E. Cline --Density. Solar Cells, 24 () - ANALYSIS AND CHARACTERIZATION OF THIN FILMS: A TUTORIAL* LAWRENCE L. KAZMERSKI Solar Energy Research Institute, Cole Boulevard, Golden, CO (U.S.A.) (Received Janu ; accepted Ma ) Summary The characterization of thin films used in photovoltaic applications is discussed in terms of the Cited by: Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin ometry measures the change of polarization upon reflection or transmission and compares it to a model.

It can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity. Antimony selenosulfide, Sb2(S,Se)3, has attracted attention over the last few years as a light-harvesting material for photovoltaic technology owing Cited by: 1.

Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this : Springer-Verlag Berlin Heidelberg.

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Measured samples include thermally grown and evaporated SiO 2 on a silicon substrate and a polymer photoresist layer on silicon.

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Thermal conductivities of SiO 2 with thicknesses from to μm on Si wafer, e-beam evaporated thin nickel film on Si wafer, and thermal barrier coatings are obtained.

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Abstract: Thin-film transistors (TFTs), which use zinc oxide (ZnO) as an active layer, were fabricated and investigated in detail. The transport properties of ZnO deposited by spray pyrolysis (SP) on a TFT structure are studied in a wide range of temperatures, electrical conditions (i.e., subthreshold, above-threshold linear, and saturation regions), and at different channel lengths.

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